Development of technology for production of nanocrystalline silicon films based on amorphous Si-Sn-C and control methods and the pn-junction structure
Developed and implemented technological scheme of low-temperature synthesis of nanocrystalline silicon films. The method of thermal vacuum deposition in a stream of high-energy electrons. Theoretical model of the thin-film photovoltaic based nanocrystalline silicon (nc-Si). The model takes into account the three-dimensional distribution of potential barriers.